Trichlorosilane is used for polycrystalline silicon, monocrystalline silicon raw materials, epitaxial growth, silicon liquid, silicon oil, chemical vapor deposition, silicon compound manufacturing, electronic gas manufacturing.
SPECIFICATION
Product Name:Trichlorosilane(TCS)
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CAS number:10025-78-2
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Product Standard: GB/T 20434-2006 (Made in China)
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High-boiling (wt%) < 0.001
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Content of HCL (wt%) ≤0.01
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Content of SiHCl3 (wt%) ≥ 99.99
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(CH3)2SiHCL ppmwt ≤ 300
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Content of SiH2Cl2 (wt%) ≤ 0.01
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CH3SiHCL2 ppmwt ≤ 200
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Content of SiCl4 (wt%) ≤0.01
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CH3SiCL3 ppmwt ≤ 200
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B ppba ≤ 100
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i-C5H12 ppmwt ≤ 200
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Ni ppbwt ≤ 10
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Cr ppbwt ≤ 10
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Al ppbwt ≤ 10
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Fe ppbwt ≤ 10
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P ppbwt ≤ 10
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PROPERTIES AND APPLICAITONS:
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We have used advanced technology to precondition ordinary silicon tetrachloride and then remove the metal ions and the C-H bond-containing substances in raw material through rectification and molecular sieve adsorption. The purity of silicon tetrachloride can reach 9N or above, which can fully meet the needs to produce optical fiber preform.
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PACKAGE, STORAGE AND HANDLING:ISO TANK
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